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Photon-Plasma-CVD for the Synthesis of ultra hard, heat and wear resistant films on C-N-basis at atmospheric pressure (Vo 530/18-1)

During the first part of the project it was shown that the creating of stable plasmas with an addition of nitrogen using CO2 laser in open environment at atmospheric pressure is possible. Using these plasmas in random sampling experiments films were synthesized. These films show excellent characteristics concerning the abrasive wear of the layer itself as well as of the material of the friction partner.

The goal of the second part of the project is, based on these plasmas with additional nitrogen, to be able to deposit reproducible C-N-films and film systems with defined wear characteristics by a high efficiency and a high reliability of deposition process. Therefore the process quantities shall be varied purposeful and measured online. A correlation between the process quantities, the film composition, the film morphology and the wear characteristics is to be established.

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Funded by

DFG

Timeframe

2006/04/01 - 2008/09/30

Department Manager

Dipl.-Ing. Thomas Seefeld

Phone: +49(0)421 - 218 58000 (Switchboard)

+49(0)421 - 218 58040 (Direct Line)